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US Patent Issued to ASM IP Holding on July 7 for "Vapor deposition processes, reactants and deposition assemblies" (Canadian, Belgian, Finnish Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,607, issued on July 7, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Vapor deposition processes, reactants and deposition asse... Read More


US Patent Issued to Mitsubishi Electric on July 7 for "Semiconductor device and method for manufacturing the same" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,608, issued on July 7, was assigned to Mitsubishi Electric Corp. (Tokyo). "Semiconductor device and method for manufacturing the same" was i... Read More


US Patent Issued to Applied Materials on July 7 for "Germanium and silicon stacks for 3D NAND" (California Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,609, issued on July 7, was assigned to Applied Materials Inc. (Santa Clara, Calif.). "Germanium and silicon stacks for 3D NAND" was invented... Read More


US Patent Issued to ASM IP Holding on July 7 for "Method for processing a substrate" (South Korean Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,610, issued on July 7, was assigned to ASM IP Holding B.V. (Almere, Netherlands). "Method for processing a substrate" was invented by DongHy... Read More


US Patent Issued to Tokyo Electron on July 7 for "Substrate processing method and substrate processing apparatus" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,611, issued on July 7, was assigned to Tokyo Electron Ltd. (Tokyo). "Substrate processing method and substrate processing apparatus" was inv... Read More


US Patent Issued to Kokusai Electric on July 7 for "Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,612, issued on July 7, was assigned to Kokusai Electric Corp. (Tokyo). "Method of processing substrate, method of manufacturing semiconducto... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 7 for "Heat dissipation for field effect transistors" (Taiwanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,613, issued on July 7, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Heat dissipation for field effect... Read More


US Patent Issued to SAMSUNG ELECTRONICS on July 7 for "Plasma edge ring, plasma etching apparatus including the same, and plasma etching method using the same" (South Korean Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,614, issued on July 7, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea). "Plasma edge ring, plasma etching apparatus ... Read More


US Patent Issued to DISCO on July 7 for "Method for processing device wafer" (Japanese Inventor)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,615, issued on July 7, was assigned to DISCO Corp. (Tokyo). "Method for processing device wafer" was invented by Naoko Yamamoto (Tokyo). Ac... Read More


US Patent Issued to Kokusai Electric on July 7 for "Substrate processing method, method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,616, issued on July 7, was assigned to Kokusai Electric Corp. (Tokyo). "Substrate processing method, method of manufacturing semiconductor d... Read More